Thermal oxidation of chemical vapour deposited tungsten layers on silicon substrates for embedded non-volatile memory application

Published 2008 View Full Article

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Title
Thermal oxidation of chemical vapour deposited tungsten layers on silicon substrates for embedded non-volatile memory application
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 517, Issue 16, Pages 4534-4539
Publisher
Elsevier BV
Online
2008-12-25
DOI
10.1016/j.tsf.2008.12.036

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