4.4 Article Proceedings Paper

Surface photovoltage investigation of recombination at the a-Si/c-Si heterojunction

Journal

THIN SOLID FILMS
Volume 517, Issue 23, Pages 6396-6400

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2009.02.090

Keywords

Surface photovoltage; Band bending; Interface defects; Amorphous/crystalline heterojunction

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We investigate the use of time-resolved surface photovoltage (SPV) transients as a means to determine band bending and recombination properties at amorphous/crystalline silicon (a-Si:H/c-Si) heterojunctions. Experimentally, it is shown that for a-Si:H film thicknesses above similar to 6 nm, SPV transients do not depend on the film thickness anymore. On this basis, a simple numerical model is proposed that consists of a single rechargeable gap state on the c-Si wafer surface, into which the properties of the a-Si:H/c-Si interface and the adjacent a-Si:H are lumped. It is shown that this model can reproduce all principal features of high excitation SPV transients. i.e. an initial fast decay shown to be due to Auger recombination, a plateau region for high injection conditions and a fast decay when the sample returns into low injection and the defect states are recharged. Under sufficiently high excitation, the SPV saturates at a value that is determined by the a-Si:H/c-Si interface band bending in the dark. From the slope of the transient decay, defect parameters (density, energetic position) can be extracted. (C) 2009 Elsevier B.V. All rights reserved.

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