Modeling and experiments of high-pressure VHF SiH4/H2 discharges for higher microcrystalline silicon deposition rate

Published 2008 View Full Article

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Title
Modeling and experiments of high-pressure VHF SiH4/H2 discharges for higher microcrystalline silicon deposition rate
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 516, Issue 20, Pages 6829-6833
Publisher
Elsevier BV
Online
2008-02-23
DOI
10.1016/j.tsf.2007.12.066

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