Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVD

Published 2007 View Full Article

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Title
Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVD
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 516, Issue 5, Pages 533-536
Publisher
Elsevier BV
Online
2007-06-19
DOI
10.1016/j.tsf.2007.06.111

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