Complete prevention of reaction at HfO2/Si interfaces by 1nm silicon nitride layer

Published 2008 View Full Article

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Title
Complete prevention of reaction at HfO2/Si interfaces by 1nm silicon nitride layer
Authors
Keywords
-
Journal
SURFACE SCIENCE
Volume 602, Issue 11, Pages 1948-1953
Publisher
Elsevier BV
Online
2008-04-01
DOI
10.1016/j.susc.2008.03.031

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