Journal
SUPERLATTICES AND MICROSTRUCTURES
Volume 65, Issue -, Pages 285-298Publisher
ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2013.11.007
Keywords
Nano-ZnO thin films; RF sputtering; Different substrate temperature; Structure; Optical properties; Effective mass; Dispersion energy and dielectric constants
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A Radio Frequency (RF) technique was used to prepare ZnO thin films with different substrate temperature under ultra high vacuum. Structure results revealed that these films have crystalline structure. The structure of these films was carried out using Xray Diffraction and Atomic Force Electron Microscope (AFM). The grain size for these films were determined using AFM photos. The optical parameters such as, optical energy gap, refractive index, extinction coefficient, dielectric loss and dielectric tangent loss for these films were determined. Another important parameters such as dispersion energy, oscillating energy and the ratio between the free carrier concentration/effective mass (N/m*) were determined optically. It was found that, the substrate temperature for these investigated films plays an important rule for changing an optical and dielectric results of these films. (C) 2013 Elsevier Ltd. All rights reserved.
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