Method and mechanism of vapor phase treatment–total reflection X-ray fluorescence for trace element analysis on silicon wafer surface

Published 2010 View Full Article

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Title
Method and mechanism of vapor phase treatment–total reflection X-ray fluorescence for trace element analysis on silicon wafer surface
Authors
Keywords
-
Journal
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
Volume 65, Issue 12, Pages 1022-1028
Publisher
Elsevier BV
Online
2010-11-20
DOI
10.1016/j.sab.2010.11.006

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