Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories

Published 2011 View Full Article

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Title
Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories
Authors
Keywords
-
Journal
SOLID-STATE ELECTRONICS
Volume 68, Issue -, Pages 38-47
Publisher
Elsevier BV
Online
2011-11-16
DOI
10.1016/j.sse.2011.09.016

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