Journal
SOLID-STATE ELECTRONICS
Volume 75, Issue -, Pages 93-96Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.sse.2012.04.029
Keywords
InGaZnO; Thin-film transistors; Subgap density of states; Channel resistance
Ask authors/readers for more resources
The demand for amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) has increased due to their transparent properties. In this paper, we report on the relationship between the subgap density of states (DOS), field-effect mobility (mu(FE)), and unit channel length resistance (r(ch)) on the electrical properties of a-IGZO TFT's. The three tested structures had the same channel width/length and gate insulator thickness with different gate insulator materials, SiNx. SiOx, and SiOx/SiNx. Compared to TFTs with low subgap DOS levels, TFTs with high subgap DOS levels have low mu(FE) values due to the relatively large r(ch) values. (C) 2012 Elsevier Ltd. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available