Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors

Published 2011 View Full Article

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Title
Structural and electrical characteristics of RF-sputtered HfO2 high-k based MOS capacitors
Authors
Keywords
-
Journal
SOLID-STATE ELECTRONICS
Volume 62, Issue 1, Pages 44-47
Publisher
Elsevier BV
Online
2011-05-10
DOI
10.1016/j.sse.2011.04.009

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