Extraction of trap energy and location from random telegraph noise in gate leakage current (Ig RTN) of metal–oxide semiconductor field effect transistor (MOSFET)

Title
Extraction of trap energy and location from random telegraph noise in gate leakage current (Ig RTN) of metal–oxide semiconductor field effect transistor (MOSFET)
Authors
Keywords
-
Journal
SOLID-STATE ELECTRONICS
Volume 54, Issue 4, Pages 362-367
Publisher
Elsevier BV
Online
2010-01-07
DOI
10.1016/j.sse.2009.12.033

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search