4.3 Article

Comparison of contact resistance between accumulation-mode and inversion-mode multigate FETs

Journal

SOLID-STATE ELECTRONICS
Volume 52, Issue 11, Pages 1815-1820

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.sse.2008.09.006

Keywords

Accumulation-mode; Silicon-on-insulator; Multigate MOSFET

Funding

  1. Science Foundation Ireland Grant [05/IN/1888]

Ask authors/readers for more resources

The performances of accumulation-mode and inversion-mode multigate FETs are compared. The influence of gate underlap on the electrical properties is analyzed. Both simulation results and experimental data show that in a device with gate underlap, accumulation-mode devices have a higher current drive, lower source and drain resistance and less process variability than inversion-mode FETs. (C) 2008 Elsevier Ltd. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.3
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available