The deposition of intrinsic hydrogenated amorphous silicon thin films incorporated with oxygen by plasma-enhanced vapor deposition

Published 2013 View Full Article

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Title
The deposition of intrinsic hydrogenated amorphous silicon thin films incorporated with oxygen by plasma-enhanced vapor deposition
Authors
Keywords
-
Journal
SOLID STATE SCIENCES
Volume 20, Issue -, Pages 70-74
Publisher
Elsevier BV
Online
2013-03-27
DOI
10.1016/j.solidstatesciences.2013.03.015

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