Study of mechanism of stress-induced threshold voltage shift and recovery in top-gate amorphous-InGaZnO4 thin-film transistors with source- and drain-offsets

Title
Study of mechanism of stress-induced threshold voltage shift and recovery in top-gate amorphous-InGaZnO4 thin-film transistors with source- and drain-offsets
Authors
Keywords
-
Journal
SOLID STATE COMMUNICATIONS
Volume 152, Issue 18, Pages 1739-1743
Publisher
Elsevier BV
Online
2012-06-20
DOI
10.1016/j.ssc.2012.06.012

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