Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application

Published 2013 View Full Article

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Title
Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
Authors
Keywords
-
Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 120, Issue -, Pages 204-208
Publisher
Elsevier BV
Online
2013-10-16
DOI
10.1016/j.solmat.2013.09.004

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