4.4 Article

Low contact resistance in epitaxial graphene devices for quantum metrology

Journal

AIP ADVANCES
Volume 5, Issue 8, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4928653

Keywords

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Funding

  1. Graphene Flagship [CNECT-ICT-604391]
  2. Swedish Foundation for Strategic Research (SSF)
  3. Linnaeus Centre for Quantum Engineering
  4. Knut and Alice Wallenberg Foundation
  5. Chalmers AoA Nano
  6. Swedish-Korean Basic Research Cooperative Program of the NRF [2014R1A2A1A1 2067266]
  7. EMRP project GraphOhm
  8. EMRP within EURAMET
  9. EMRP within European Union

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We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Omega up to 11 k Omega. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (< 10 Omega) suitable for high precision quantum resistance metrology. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

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