Structure and optical properties of SiN x : H films with Si nanoclusters produced by low-frequency plasma-enhanced chemical vapor deposition

Published 2009 View Full Article

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Title
Structure and optical properties of SiN x : H films with Si nanoclusters produced by low-frequency plasma-enhanced chemical vapor deposition
Authors
Keywords
-
Journal
SEMICONDUCTORS
Volume 43, Issue 11, Pages 1514-1520
Publisher
Pleiades Publishing Ltd
Online
2009-11-06
DOI
10.1134/s1063782609110207

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