ICP-RIE etching of polar, semi-polar and non-polar AlN: comparison of Cl2/Ar and Cl2/BCl3/Ar plasma chemistry and surface pretreatment

Published 2014 View Full Article

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Title
ICP-RIE etching of polar, semi-polar and non-polar AlN: comparison of Cl2/Ar and Cl2/BCl3/Ar plasma chemistry and surface pretreatment
Authors
Keywords
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Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 30, Issue 1, Pages 015021
Publisher
IOP Publishing
Online
2014-12-30
DOI
10.1088/0268-1242/30/1/015021
References
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