Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 29, Issue 9, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/29/9/095003
Keywords
contact resistance; phase change; nanowire; spacer etch
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Funding
- EPSRC [EP/H02607X/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/H02607X/1] Funding Source: researchfish
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Ge2Sb2Te5 (GST) phase change nanowires have been fabricated using a top-down spacer etch process. This approach enables controls over the dimension and location of the nanowires without affecting the electrical properties. Phase change devices based on these nanowires have been used to systematically investigate the contact resistance between GST phase change material and TiN metal electrodes. The specific contact resistance was found to be 7.96 x 10(-5) Omega cm(2) for crystalline GST and 6.39 x 10(-2) Omega cm(2) for amorphous GST. The results suggest that contact resistance plays a dominant role in the total resistance of GST memory device in both crystalline and amorphous states.
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