Fabrication and characterization of sub-0.6-µm ferroelectric-gate field-effect transistors

Published 2010 View Full Article

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Title
Fabrication and characterization of sub-0.6-µm ferroelectric-gate field-effect transistors
Authors
Keywords
-
Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 25, Issue 11, Pages 115013
Publisher
IOP Publishing
Online
2010-10-16
DOI
10.1088/0268-1242/25/11/115013

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