Low-thermal surface preparation, HCl etch and Si/SiGe selective epitaxy on (1 1 0) silicon surfaces

Published 2008 View Full Article

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Title
Low-thermal surface preparation, HCl etch and Si/SiGe selective epitaxy on (1 1 0) silicon surfaces
Authors
Keywords
-
Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 23, Issue 10, Pages 105018
Publisher
IOP Publishing
Online
2008-09-17
DOI
10.1088/0268-1242/23/10/105018

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