4.7 Article

Concentration characteristics of diffusion-induced recrystallization in Cu/CuAu multilayers of varying lattice mismatch

Journal

SCRIPTA MATERIALIA
Volume 62, Issue 3, Pages 144-147

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2009.10.012

Keywords

Diffusion-induced grain boundary motion (DIGM); Recrystallization; Thin film multilayers; X-ray diffraction (XRD); CuAu

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New grains appear in Cu/Au(Cu) thin film interdiffusion couples by diffusion-induced recrystallization. These grains are grouped into different generations of characteristic concentration levels. In this study, the lattice mismatch between initial diffusion partners is systematically varied. It is demonstrated that the intermediate concentrations shift parallel to the concentration of the initial layers. Thus, the characteristic compositions are controlled by the requirement of a characteristic lattice mismatch between parent layer and new grain rather than by metastable phases or highest chemical driving forces. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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