4.0 Article

Raman studies on the effect of multiple-energy ion implantation on single-crystal hexagonal boron nitride

Journal

RADIATION EFFECTS AND DEFECTS IN SOLIDS
Volume 170, Issue 3, Pages 175-182

Publisher

TAYLOR & FRANCIS LTD
DOI: 10.1080/10420150.2014.984612

Keywords

ion implantation; boron nitride; Raman spectroscopy

Funding

  1. DST-NRF Centre of Excellence in Strong Materials
  2. University of the Witwatersrand

Ask authors/readers for more resources

Single energy ion implantation of hexagonal boron nitride (h-BN) at various fluences and keV energies has shown that there is a change in the local symmetry of the crystal from hexagonal to the cubic (c-BN) symmetry. These conclusions have been primarily based on Raman scattering (RS) and Fourier transform infrared spectroscopy. Transmission electron microscopy (TEM) analyses have been a challenge because the sample preparation for cross-sectional study of both the polycrystalline substrates and single-crystal material used in the study presented problems that were difficult to circumvent. A multiple-energy implant with different fluence fractions has been used to create a uniform implanted layer in the material from the surface to the end of range of the implant in this study. We report on the initial RS studies on these samples.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.0
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available