Electric field and temperature scaling of polarization reversal in silicon doped hafnium oxide ferroelectric thin films

Title
Electric field and temperature scaling of polarization reversal in silicon doped hafnium oxide ferroelectric thin films
Authors
Keywords
Hafnium oxide, Ferroelectric, Domain switching, Temperature dependence, Endurance
Journal
ACTA MATERIALIA
Volume 99, Issue -, Pages 240-246
Publisher
Elsevier BV
Online
2015-08-13
DOI
10.1016/j.actamat.2015.07.035

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