Journal
PROCEEDINGS OF THE IEEE
Volume 98, Issue 7, Pages 1127-1139Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPROC.2010.2044858
Keywords
Degradation; failure mechanisms; GaN heterojunction field effect transistors (HFET); reliability
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Funding
- Air Force Office of Scientific Research (AFOSR)
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GaN-based heterojunction field effect transistors (HFETs) will play major roles in the high-power, high-frequency military and commercial arenas for microwave and millimeter wave transmitters and receivers used in communications and radar devices. In fact, devices operative in the X-band (7-12.5 GHz) and beyond are already at market and boast quite impressive performances. Having improved the crystal quality now to levels where the reliability [expressed as mean time to failure (MTTF)] is claimed to exceed ten million hours, the work now needs to focus on which of the physical mechanisms responsible for degradation are the most important, and how the existing degradation accelerates subsequent degradation, ultimately resulting in device failure. Available data show that not all devices from the same wafer show similar longevity and the wide spread of activation energies reported for three-temperature extrapolation-based predictions of the lifetime are troubling. If we hope to make consistent, reliable predictions of device lifetimes, particularly when the devices are being pushed in radio-frequency (RF) operation to near their limits, more work will need to be done in characterizing the long term stability of the devices, and new physical models for the failure mechanisms will have to be developed.
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