Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency

Published 2010 View Full Article

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Title
Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: I. Scaling with high frequency
Authors
Keywords
-
Journal
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume 19, Issue 5, Pages 055011
Publisher
IOP Publishing
Online
2010-09-21
DOI
10.1088/0963-0252/19/5/055011

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