Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma

Published 2010 View Full Article

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Title
Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma
Authors
Keywords
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Journal
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume 19, Issue 4, Pages 045020
Publisher
IOP Publishing
Online
2010-07-09
DOI
10.1088/0963-0252/19/4/045020
References
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