Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization

Title
Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization
Authors
Keywords
-
Journal
Plasma Processes and Polymers
Volume 8, Issue 8, Pages 740-749
Publisher
Wiley
Online
2011-06-30
DOI
10.1002/ppap.201000147

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