Effective work function of metals interfaced with dielectrics: A first-principles study of the Pt-HfO2interface

Phase equilibria atSi-HfO2andPt-HfO2interfaces from first principles thermodynamics

(2010) H. Zhu et al.   PHYSICAL REVIEW B

Evolution of the band alignment at polar oxide interfaces

(2010) J. D. Burton et al.   PHYSICAL REVIEW B

Systematic study on work-function-shift in metal/Hf-based high-k gate stacks

(2009) Yuki Kita et al.   APPLIED PHYSICS LETTERS

Extended Frenkel pairs and band alignment at metal-oxide interfaces

(2009) O. Sharia et al.   PHYSICAL REVIEW B

Te-induced modulation of the Mo∕HfO2 interface effective work function

(2008) Ka Xiong et al.   APPLIED PHYSICS LETTERS

Segregation of oxygen vacancy at metal-HfO2 interfaces

(2008) Eunae Cho et al.   APPLIED PHYSICS LETTERS

Metal Electrode/High-$k$ Dielectric Gate-Stack Technology for Power Management

(2008) Byoung Hun Lee et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Band Offsets at Semiconductor-Oxide Interfaces from Hybrid Density-Functional Calculations

(2008) Audrius Alkauskas et al.   PHYSICAL REVIEW LETTERS

Decoupling the Fermi-level pinning effect and intrinsic limitations on p-type effective work function metal electrodes

(2007) Huang-Chun Wen et al.   MICROELECTRONIC ENGINEERING