Correlation between self-diffusion in Si and the migration mechanisms of vacancies and self-interstitials: An atomistic study

Published 2008 View Full Article

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Title
Correlation between self-diffusion in Si and the migration mechanisms of vacancies and self-interstitials: An atomistic study
Authors
Keywords
-
Journal
PHYSICAL REVIEW B
Volume 78, Issue 3, Pages -
Publisher
American Physical Society (APS)
Online
2008-07-22
DOI
10.1103/physrevb.78.035208

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