Journal
ORGANIC ELECTRONICS
Volume 10, Issue 6, Pages 1102-1108Publisher
ELSEVIER
DOI: 10.1016/j.orgel.2009.05.024
Keywords
Photoresist-free process; Non-relief-patterned surface patterning; Organic thin film transistor
Funding
- Information Display RD Center [F0004024-2008-31]
- Ministry of Knowledge Economy of Korean government
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High-resolution patterned nanoparticulate Ag electrode arrays and all printed organic thin film transistors (OTFTs) were demonstrated using a simple dip-casting and a photoresist-free, non-relief-pattern lithographic process. An octadecyltrichlorosilane self-assembled monolayer was deposited to provide low surface energy and patterned by deep ultraviolet light, resulting in reproducible periodic arrays of patterned hydrophilic domains separated from hydrophobic surroundings. Using a simple dip-casting with optimal withdrawal speed, viscosity, and solvent polarity, dot size and electrode width of less than 1 mu m and 5 mu m were obtained, respectively. All printed OTFrs were fabricated. Ink-jet printed 6,13-bis(triisopropyl-silylethynyl) pentacene OTFTs; including high-resolution patterned nanoparticulate Ag source/drain electrodes (L < 10 mu m) have shown similar performance to the OTFTs with photolithographically patterned electrodes. (C) 2009 Elsevier B.V. All rights reserved.
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