A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications

Published 2015 View Full Article

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Title
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications
Authors
Keywords
Tetrafluoromethane, Perfluorocyclobutane, Plasma diagnostics, Modeling, Reaction kinetics, Plasma modeling
Journal
THIN SOLID FILMS
Volume 579, Issue -, Pages 136-143
Publisher
Elsevier BV
Online
2015-03-01
DOI
10.1016/j.tsf.2015.02.060

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