Transparent silicon nitride films prepared by surface wave plasma chemical vapor deposition under low temperature conditions

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Title
Transparent silicon nitride films prepared by surface wave plasma chemical vapor deposition under low temperature conditions
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 580, Issue -, Pages 111-115
Publisher
Elsevier BV
Online
2014-10-16
DOI
10.1016/j.tsf.2014.09.068

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