Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method

Published 2015 View Full Article

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Title
Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method
Authors
Keywords
Bismuth Neodymium Titanate, Pulsed Laser Deposition, Large Area Deposition, Ferroelectric Materials, Thin Films, Film Thickness Distribution
Journal
THIN SOLID FILMS
Volume 591, Issue -, Pages 126-130
Publisher
Elsevier BV
Online
2015-08-12
DOI
10.1016/j.tsf.2015.08.009

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