Journal
OPTICS LETTERS
Volume 37, Issue 24, Pages 5100-5102Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.37.005100
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Fresnel zone plates are used for imaging at extreme ultraviolet and soft x-ray wavelengths. Fabricating these zone plates is challenging due to small structure sizes (<150 nm) and complex nanostructuring processes. Fabrication techniques such as electron-beam lithography followed by etching and electroplating processes have been developed over the years. We are reporting on the development of a technique incorporating focused gallium ion-beam lithography to fabricate Fresnel zone plates with 120 nm outermost structure size in a process that combines pattern exposure and structure transfer in one single step. The fabricated zone plates were successfully applied in a microscopic setup at lambda = 13 nm wavelength. (C) 2012 Optical Society of America
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