Properties of LaAlO3 thin film on GaAs(100) treated by in situ NH3 plasma

Published 2013 View Full Article

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Title
Properties of LaAlO3 thin film on GaAs(100) treated by in situ NH3 plasma
Authors
Keywords
-
Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume 307, Issue -, Pages 349-352
Publisher
Elsevier BV
Online
2013-03-26
DOI
10.1016/j.nimb.2013.01.079

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