Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volume 268, Issue 11-12, Pages 1889-1892Publisher
ELSEVIER
DOI: 10.1016/j.nimb.2010.02.050
Keywords
Rutherford Backscattering Spectrometry; Organic semiconductor thin film; Doping of organic semiconductors; Surface self-assembly; Radiation stability of organic films; Ion beam assisted decomposition of organic thin film
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Funding
- Div Of Electrical, Commun & Cyber Sys [0822036] Funding Source: National Science Foundation
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We describe new Rutherford Backscattering Spectroscopy (RBS) measurements to explore the surface chemistry associated with the growth of self-assembled monolayer (SAM) molecules on conducting organic films. The report includes a description of the optimization of both substrates and RBS scattering parameters to appropriately analyze these novel and damage susceptible structures. Our RBS measurements reveal that the final surface stoichiometiy is consistent with a specific model of hydrolyzed and crosslinked trichlorosilanes that form a dense two-dimensional network (a monolayer) at the surface of small-molecule organic semiconductors and a bulk SAM network in the case of conjugated polymer films. Organic semiconductors used in this study are thin films of rubrene (a small molecule semiconductor (C42H28)) and Poly(3-hexyl)thiophene (P3HT) (a conjugated polymer (C10H18S)(n)). As a substrate we used a thick (1 mu m) film of parylene (a non-conjugated polymer (C8H8)(n)) deposited on Si (1 0 0) wafers. The SAM molecules used to functionalize the organic semiconductor films are fluoroalkyl trichlorosilane (FTS) (C-8(H4F13)SiCl3) and octyltrichlorosilane COTS) (C8H17SiCl3). Quantitative detection of medium and small-mass elements, such as O, F, Si, S and residual Cl is demonstrated and used to elucidate the surface chemistry in these novel organic systems. (C) 2010 Elsevier B.V. All rights reserved.
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