Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films

Published 2009 View Full Article

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Title
Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films
Authors
Keywords
-
Journal
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
Volume 606, Issue 3, Pages 821-823
Publisher
Elsevier BV
Online
2009-05-16
DOI
10.1016/j.nima.2009.05.020

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