Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

Title
Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon
Authors
Keywords
Nano-texturing, Surface passivation, Reactive ion etching, Negative charge, Al, 2, O, 3, Atomic Layer Deposition
Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 142, Issue -, Pages 29-33
Publisher
Elsevier BV
Online
2015-06-06
DOI
10.1016/j.solmat.2015.05.027

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