Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor

Published 2009 View Full Article

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Title
Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 20, Issue 24, Pages 245604
Publisher
IOP Publishing
Online
2009-05-28
DOI
10.1088/0957-4484/20/24/245604

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