Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction

Published 2009 View Full Article

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Title
Ultrafast and selective reduction of sidewall roughness in silicon waveguides using self-perfection by liquefaction
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 20, Issue 34, Pages 345302
Publisher
IOP Publishing
Online
2009-08-05
DOI
10.1088/0957-4484/20/34/345302

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