The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area

Title
The residual pattern of double thin-film over-etching for the fabrication of continuous patterns with dimensions varying from 50 nm to millimeters over a large area
Authors
Keywords
-
Journal
NANOTECHNOLOGY
Volume 19, Issue 15, Pages 155301
Publisher
IOP Publishing
Online
2008-03-12
DOI
10.1088/0957-4484/19/15/155301

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now