4.8 Article

Dually Active Silicon Nanowire Transistors and Circuits with Equal Electron and Hole Transport

Journal

NANO LETTERS
Volume 13, Issue 9, Pages 4176-4181

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nl401826u

Keywords

Silicon nanowire; RFET; strain; reconfigurable logic; Schottky barrier FET; CMOS

Funding

  1. Deutsche Forschungsgemeinschaft (DFG) [MI 1247/6-1]

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We present novel multifunctional nanocircuits built from nanowire transistors that uniquely feature equal electron and hole conduction. Thereby, the mandatory requirement to yield energy efficient circuits with a single type of transistor is shown for the first time. Contrary to any transistor reported up to date, regardless of the technology and semiconductor materials employed, the dually active silicon nanowire channels shown here exhibit an ideal symmetry of current voltage device characteristics for electron (n-type) and hole (p-type) conduction as evaluated in terms of comparable currents, turn-on threshold voltages, and switching slopes. The key enabler to symmetry is the selective tunability of the tunneling transmission of charge carriers as rendered by the combination of the nanometer-scale dimensions of the junctions and the application of radially compressive strain. To prove the advantage of this concept we integrated dually active transistors into cascadable and multifunctional one-dimensional circuit strings. The nanocircuits confirm energy efficient switching and can further be electrically configured to provide four different types of operation modes compared to a single one when employing conventional electronics with the same amount of transistors.

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