Journal
NANO LETTERS
Volume 13, Issue 3, Pages 873-883Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nl3033075
Keywords
Nanowires; vapor-liquid-solid; nucleation; incubation time; pulsed deposition; chemical vapor deposition; non-steady state; numerical simulation
Categories
Funding
- European commission [246331, 257856, 227497]
Ask authors/readers for more resources
Today, the vapor liquid solid (VLS) growth mechanism is a common process for the metal catalyzed bottom-up growth of semiconductor nanowires (NWs). Nevertheless, most of the literature only is concerned with the steady-state NW growth which applies when the amount of material supplied is equal to the amount consumed by the NW growth at the same time. While this description is suitable for chemical vapor deposition (CVD) or electron beam evaporation (EBE) processes after the initial nucleation time, problems arise when pulsed growth processes like pulsed laser deposition (PLD) are used since in this case the steady state growth condition cannot be applied. Moreover, the initial phase of NW growth cannot be described with steady state growth conditions, either. In this work, we present a modeling approach for VLS NW growth based on numerical simulations, which is capable of describing the nucleation phase of the VLS growth process as well as a pulsed deposition process.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available