4.8 Article

Controlled Ambipolar Doping and Gate Voltage Dependent Carrier Diffusion Length in Lead Sulfide Nanowires

Journal

NANO LETTERS
Volume 12, Issue 11, Pages 5890-5896

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nl303294k

Keywords

Nanowires; lead sulfide; doping; field effect transistors; scanning photocurrent microscopy; carrier diffusion length

Funding

  1. U.C. Davis Startup fund
  2. National Research Foundation of Korea (NRF)
  3. Korea government (MEST) [2011-0011883]
  4. Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy [DE-AC02-05CH11231]
  5. National Research Foundation of Korea [2011-0011883] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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We report a simple, controlled doping method for achieving n-type, intrinsic, and p-type lead sulfide (PbS) nanowires (NWs) grown by chemical vapor deposition without introducing any impurities. A wide range of carrier concentrations is realized by adjusting the ratio between the Pb and S precursors. The field effect electron mobility of n-type PbS NWs is up to 660 cm(2)/(V s) at room temperature, in agreement with a long minority carrier diffusion length measured by scanning photocurrent microscopy (SPCM). Interestingly, we have observed a strong dependence of minority carrier diffusion length on gate voltage, which can be understood by considering a carrier concentration dependent recombination lifetime. The demonstrated ambipolar doping of high quality PbS NWs opens up exciting avenues for their applications in photodetectors and photovoltaics.

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