Sub-10-nm Wide Trench, Line, and Hole Fabrication Using Pressed Self-Perfection

Published 2008 View Full Article

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Title
Sub-10-nm Wide Trench, Line, and Hole Fabrication Using Pressed Self-Perfection
Authors
Keywords
-
Journal
NANO LETTERS
Volume 8, Issue 7, Pages 1986-1990
Publisher
American Chemical Society (ACS)
Online
2008-06-10
DOI
10.1021/nl801030c

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