Advanced mask aligner lithography (AMALITH) for thick photoresist

Published 2013 View Full Article

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Title
Advanced mask aligner lithography (AMALITH) for thick photoresist
Authors
Keywords
-
Journal
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
Volume 20, Issue 10-11, Pages 1839-1842
Publisher
Springer Nature
Online
2013-11-07
DOI
10.1007/s00542-013-1950-5
References
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