Journal
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
Volume 16, Issue 8-9, Pages 1451-1456Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00542-009-0944-9
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Most anodic aluminum oxide (AAO) or porous anodic aluminum (PAA) films were fabricated using the potentiostatic method from high-purity (99.999%) aluminum films at low temperatures of 0-10A degrees C to avoid dissolution effects at room temperature (RT). In this article, the fabrication of AAO or PAA film from commercial purity (99%) aluminum at RT has been investigated using hybrid pulse anodization under different oxalic acid concentration and process duration. The effect of acid concentration and anodization duration on the formation of AAO size and morphology has been studied. Both pore diameter and oxide layer thickness of AAO films were examined via SEM images and found that both increased with increasing oxalic concentration and anodization duration. In addition, the pore distribution was more concentrated at high electrolytic concentration and anodization duration.
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