Journal
MICROSCOPY AND MICROANALYSIS
Volume 20, Issue 2, Pages 627-634Publisher
CAMBRIDGE UNIV PRESS
DOI: 10.1017/S1431927613014116
Keywords
electron correlograph analysis; angular autocorrelation; amorphous; medium-range order; scanning transmission electron microscopy; electron diffraction
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Funding
- US Department of Energy Office of Science Laboratory [DE-AC02-06CH11357]
- US Department of Energy [DE-SC0004929]
- U.S. Department of Energy (DOE) [DE-SC0004929] Funding Source: U.S. Department of Energy (DOE)
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The development of effective new tools for structural characterization of disordered materials and systems is becoming increasingly important as such tools provide the key to understanding, and ultimately controlling, their properties. The relatively novel technique of correlograph analysis (i.e., the approach of calculating angular autocorrelations within diffraction patterns) promises unique advantages for probing the local symmetries of disordered structures. Because correlograph analysis examines a component of the high-order four-body correlation function, it is more sensitive to medium-range ordering than conventional diffraction methods. As a follow-up of our previous publication, where we studied thin samples of sputtered amorphous silicon, we describe here the practical experimental method and common systematic errors of electron correlograph analysis. Using both experimental data and numerical simulations, we demonstrate that reliable structural information about the sample can only be extracted from the mean correlograph averaged over a sufficient number of individual results.
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