4.7 Article

Metal (M = Co2+, Ni2+, and Cu2+) grafted mesoporous SBA-15: Effect of transition metal incorporation and pH conditions on the adsorption of Naproxen from water

Journal

MICROPOROUS AND MESOPOROUS MATERIALS
Volume 132, Issue 3, Pages 470-479

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.micromeso.2010.03.029

Keywords

Mesoporous silica; Grafting; Transition metals; Adsorption; PPCPs

Funding

  1. National Science Foundation [CBET-0546370, CBET-0619349]
  2. Puerto Rico NASA

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Incorporation of transition metals onto the surface of mesoporous silica via grafting techniques could become a potential strategy for the bottom-up design of sorbents for the removal of pharmaceutical drugs and other emerging contaminants from water sources. Here we report the incorporation of Co2+, Ni2+ or Cu2+ onto the surface of mesoporous SBA-15 via an amino-organic grafting method and the screening of the materials as sorbents for the removal of Naproxen from water. The functionalization procedure involved the reaction of 3-aminopropyltriethoxysilane with OH groups available on SBA-15 surfaces, followed by the anchoring of the desired metal. Removal of traces of sulfates from the metal sources and further metal anchoring were achieved after post-synthesis treatment at alkaline conditions. The resulting metal-modified materials were fully characterized using X-ray powder diffraction, N-2 adsorption/desorption isotherms gathered at -196 degrees C, SEM/EDX, FT-IR, and TGA. Aqueous phase single point adsorption experiments showed that Cu-based materials are good sorbents for the uptake of low-concentration Naproxen at 25 degrees C and approaching alkaline conditions. The materials uptake capacities decreased as follows: CuNH2_g_SBA-15 > NiNH2_g_SBA-15 > CoNH2_g_SBA-15. In general, the adsorption results correlate well with the observed structural and textural properties of the materials, suggesting also that the metal amino-organic loading is highly dependent on the nature of grafting process and choice of metal. (C) 2010 Elsevier Inc. All rights reserved.

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